BMSC-20T High Vacuum Magnetron Ion Sputtering Coater
Introduction
SEM samples can be prepared by sputtering gold, platinum, chromium, tungsten, iridium and other materials to achieve no particle sense at 300K magnification.
Details
Overview
Feature
1.One-click operation, completely realize the unmanned work process. 2.More than 20 commonly used metal target parameters are built in, and the software can work directly by calling the preset target setting. 3.Sound and light signals reminder are provided when the work is completed. 4.Easy and friendly interface, 5 minutes to know how to use it. 5.The instrument is equipped with Leybold single magnetic levitation molecular pump, which has high pumping efficiency and fast working rhythm. 6.The sample room adopts the lift lid design, which can hover the lid at any angle, so that it is convenient to replace the sample and not easy to damage the glass. 7.It has automatic protection functions such as overcurrent alarm, molecular pump overheating alarm and system leakage alarm. 8.It can be used to prepare all kinds of metals and alloys, and can accurately prepare a film with the precision of 1nm. 9.It can be used to prepare silicon, tellurium, ITO, AZO and other elements and oxides. 10.It can achieve nano precision control of various film thickness (film thickness monitoring component is required). 11.The density and bonding of the deposited film can be improved by heating the sample (temperature control component is required). 12.A multi-functional tilting rotating sample platform is optional.
Introduction
BMSC-20T High Vacuum Magnetron Ion Sputtering Coater
The BMSC-20T High-Vacuum Magnetron Ion Sputtering coater is a compact desktop PVD instrument designed for surface coating processes on small-scale samples. Featuring a DC magnetron sputtering power supply, it meets the requirements for creating all types of conductive metal films, particularly excelling in nanometer and sub-micrometer film deposition. Main application fields are as follows:
SEM samples can be prepared by sputtering gold, platinum, chromium, tungsten, iridium and other materials to achieve no particle sense at 300K magnification.
Electrode preparation: all metal and alloy electrodes can be prepared.
Infrared, Raman and other samples need to have metal sputtering.
Electrochemical analysis, ceramic capacitors, flexible circuits and other sample preparation.
