BMSC-20TDP Large Chamber High Vacuum Magnetron Sputtering Coater
Introduction
1.Large chamber, capable of uniformly coating samples up to 8-inch diameter or 140mm*140mm square sample.
2.Dual magnetron sputtering target design ensures high working efficiency and excellent sample compatibility.
One-button operation, user friendly.
Details
Overview
Feature
1.Large chamber, capable of uniformly coating samples up to 8-inch diameter or 140mm*140mm square sample. 2.Dual magnetron sputtering target design ensures high working efficiency and excellent sample compatibility. 3.One-button operation, user friendly. 4.Both targets can operate independently, allowing the users to select the working sputtering target according to sample size, thereby improving target material utilization. 5.It can provide high vacuum with TMP (Turbo Molecular Pump).
Introduction
Feature
1.Large chamber, capable of uniformly coating samples up to 8-inch diameter or 140mm*140mm square sample.
2.Dual magnetron sputtering target design ensures high working efficiency and excellent sample compatibility.
3.One-button operation, user friendly.
4.Both targets can operate independently, allowing the users to select the working sputtering target according to sample size, thereby improving target material utilization.
5.It can provide high vacuum with TMP (Turbo Molecular Pump).
